Home > Technical Ceramic Parts >

Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

Product Categories

HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD

Trust Seal

Verified Supplier

Credit Check

Supplier Assessment

Contact Now

Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

Brand Name : ZG

Model Number : MS

Certification : CE

Place of Origin : CHINA

MOQ : 1 piece

Price : USD10/piece

Payment Terms : L/C, D/A, D/P, T/T, Western Union, MoneyGram

Supply Ability : 10000 pieces per month

Delivery Time : 3 working days

Packaging Details : Strong wooden box for Global shipping

Application : Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems

Diameter : Ø 1" / Ø 2" / Ø 3" / Ø 4"/ Ø 6" / Ø 8"

Thickness : 3-6mm

Grade : SAW grade and optical grade

Contact Now

Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems

We provides a wide range of sputter target including Metal , Alloy , Rare earth , Single crystal , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems , These targets can be fabricated to fit all sputtering systems including round , rectangular , S-Gun , Delta , and Ring . Sputter target can be fabricated in round or square shape , with back plate or without back plate depands on the sputtering system and target material you have , our standard size from 1" to 12 " in diameter , thickness range from 1 mm , 3 mm to 6 mm , in single or multiple-piece construction . In addition , we can offer custom specifications designed to your unique needs including , dimension , thickness , purity , density , uniform grain size , composition rate , and different back plate . We have various sputter targets in stock and can machine to your specification with good quality . Contact us for more information .

Manufacture Method	Application field
Vacuum hot pressing	Semiconductor
Hot isostatic pressing	Data storage
Cold isostatic pressing	Optoelectronics
Vacuum sintering	Flat panel display
Vacuum arc melting	Solar cell

Product Specification

Purity	99.9% / 99.99% / 99.999%
Diameter	Ø 1" / Ø 2" / Ø 3" / Ø 4"/ Ø 6" / Ø 8"
Thickness	3 mm ~ 6 mm
Back plate	OFHC copper
Bonding	Indium / Ag epoxy
Package	Vacuum sealed

1. Boride Sputter Target

CrB, FeB, HfB2, LaB6, MgB2, Mo2B5 ,NbB, SmB6, TaB, TiB2, WB, VB, VB2, ZrB2

2. Carbide Sputter Target

B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, TiCN, VC, WC, VC, ZrC

3. Fluoride Sputter Target

BaF2, CaF2, CeF3, FeF2, KF, LaF3, PbF2, MgF2, NaF

4. Nitride Sputter Target

AlN, BN, CrN, GaN, HfN, InN, NbN, NbCrN, Si3N4, TaN, TiN, VN, ZnN, ZrN, ZrCN

5. Oxide Sputter Target

Al2O3, ATO, AZO, BaTiO3, BSCCO, BST, CeO2, CuO, Cr2O3,Fe2O3, HfO2, In2O3, ITO, IZO, IZGO, IZTO, LaAl2O3, LaSrMnO3, LiNbO3, MgO, MoO3, NiO, Nb2O5, PbTiO3, PZT, Sb2O3, SiO, SiO2, SnO2, SrRuO3, SrTiO3, Ta2O5, TiO2, SnO2, V2O5, WO3, Y2O3, Yb2O3, YBCO, YSZ, ZnO, ZAO, ZGO, ZIO, ZTO

6. Selenide Sputter Target

Al2Se3, Bi2Se3, CdSe, CuSe, Cu2Se, FeSe2, GeSe, In2Se3, MoSe2, MnSe, NbSe2, PbSe, Sb2Se3, SnSe, TaSe2, WSe2, ZnSe

7. Silicide Sputter Target

CoSi2, CrSi2, FeSi2, HfSi2, MoSi2, NbSi2, NiSi2, TaSi2, TiSi2, WSi2, VSi2, ZrSi2

8. Sulphide Sputter Target

CdS, CuS, Cu2S, FeS2, GaS, GeS, In2S3, PbS, MoS2, NiS, TiS2, Sb2S3, SnS, WS2, ZnS

9. Telluride Sputter Target

Al2Te3, Bi2Te3, CdTe, CuTe, GaTe, Ga2Te3, GeTe, PbTe, MnTe, MoTe2, NbTe2, TaTe2, SbTe, SnTe, WTe2, ZnTe

Product Tags: